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implantstraggle

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Calculates the 'straggle' of the 1D doping profile from ion implant.  The script command takes the semiconductor material name, dopant type, and ion energy as input arguments.

 

Supported Product: FDTD, MODE, DEVICE, INTERCONNECT

 

Syntax

Description

out = implantstraggle("dopant", "semiconductor", E)

Provides the 'sraggle' of the 1D doping profile from ion implant in units of m. The "dopant" argument is a string providing the dopant type.  The options are (i) "boron", (ii) "phosphorous", (iii) "antimony", and (iv) "arsenic". The "semiconductor" argument is a string providing the semiconductor type.  The only available option is "silicon".  The last argument (E) is the ion energy for the implant in units of eV.

 

Example

The following script calculates the range, straggle, skewness, kurtosis, and lateral scatter for an ion implant in 'silicon' with 'boron' for an ion implant energy of 1 keV.  The script then calculates the peak concentration for the 1D doping profile for an ion dose of 2e13 /cm2 and sets up an implant doping object in the CHARGE solver to model the corresponding doping profile.

 

E = 1000;  # eV

dose = 2e13 * 1e4;  # /m^2

 

mu = implantrange("boron","silicon",E);  # range in m

si = implantstraggle("boron","silicon",E);  # straggle in m

gal = implantskewness("boron","silicon",E); # skewness

be2 = implantkurtosis("boron","silicon",E); # kurtosis

si_lat = implantlateralscatter("boron","silicon",E);  # lateral scatter in m

 

# calculate peak doping concentration

x = linspace(0,mu+10*si,1001);

y = pearson4pdf(x,mu,si,gal,be2); 

ion_absorbed = integrate(y,[1],x);  

peak = max(y)*dose/ion_absorbed;  # peak doping density in /m^3

 

# set up implant doping object (assume doping object is already present in the objects tree)

select("CHARGE::implant");

set("dopant type","p");

set("peak concentration",peak);

set("distribution function","pearson4");

set("range",mu);

set("straggle",si);

set("skewness",gal);

set("kurtosis",be2);

set("lateral scatter",si_lat);

 

 

See Also

implantrange, implantkurtosis, implantskewness, implantlateralscatter, fitnormpdf, fitpearson4pdf, pearson4pdf

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