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Adds a implant doping region to the simulation environment. This command requires a CHARGE solver region to be present in the objects tree.
Supported Product: DEVICE
Add a implant doping region in the simulation environment.
This function does not return any data.
The following script command will add a n-type implant doping object and set its properties. The implantation direction is defined by the "surface normal" property and the peak doping is defined by the "peak concentration" property.
# set dimension
V=[-0.5,-0.5;0.5,-0.5;0.5,0.5;-0.5,0.5]*1e-6; # SI unit (m)
# set doping profile
set("peak concentration",1e24); # SI unit (1/m3), equivalent to 1e18 1/cm3